The future of EUV lithography: enabling Moore's Law in the next decade

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Authors: Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura

Journal title: Extreme Ultraviolet (EUV) Lithography VIII

Journal number: 2017

Journal publisher: SPIE

Published year: 2017

Published pages: 101430G

DOI identifier: 10.1117/12.2261079