Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

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Authors: Eelco van Setten, Gerardo Bottiglieri, Laurens de Winter, Jan Lubkoll, John McNamara, Paul Rusu, Gijsbert Rispens, Jan van Schoot, Jens Timo Neumann, Matthias Roesch, Bernhard Kneer

Journal title: International Conference on Extreme Ultraviolet Lithography 2017

Journal number: 2017

Journal publisher: SPIE

Published year: 2017

Published pages: 32

DOI identifier: 10.1117/12.2280624

ISBN: 9781-510613751