Diffuser concepts for in-situ wavefront measurements of EUV projection optics

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Authors: Mark A. van de Kerkhof, Uwe Zeitner, Torsten Feigl, Stefan Bäumer, Robbert Jan Voogd, Ad Schasfoort, Evert Westerhuis, Wouter Engelen, Manfred Dikkers, Yassin Chowdhury, Michael D. Kriese

Journal title: Extreme Ultraviolet (EUV) Lithography IX

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 24

DOI identifier: 10.1117/12.2297433

ISBN: 9781-510616592