High-NA EUV lithography enabling Moore’s law in the next decade

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Authors: Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos P. Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Bernhard Kneer, Winfried Kaiser, Tilmann Heil, Sascha Migura, Peter Kuerz, Jens Timo Neumann

Journal title: International Conference on Extreme Ultraviolet Lithography 2017

Journal number: 2017

Journal publisher: SPIE

Published year: 2017

Published pages: 30

DOI identifier: 10.1117/12.2280592

ISBN: 9781-510613751