High-NA EUV lithography exposure tool progress (Conference Presentation)

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Authors: Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Hans Meiling, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Erik Loopstra, Bernhard Kneer, Sascha Migura

Journal title: International Conference on Extreme Ultraviolet Lithography 2018

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 33

DOI identifier: 10.1117/12.2502894

ISBN: 9781-510622142