High-NA EUV lithography exposure tool progress

Summary

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Authors: Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, Joerg Zimmermann, Peter Kuerz, Marco Pieters, Winfried Kaiser

Journal title: Extreme Ultraviolet (EUV) Lithography X

Journal number: 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 3

DOI identifier: 10.1117/12.2515205

ISBN: 9781-510625624