High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)

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Authors: Eelco van Setten, John McNamara, Jan van Schoot, Gerardo Bottiglieri, Kars Troost, Timon Fliervoet, Stephen Hsu, Jörg Zimmermann, Jens-Timo Neumann, Matthias Rösch, Paul Graeupner

Journal title: International Conference on Extreme Ultraviolet Lithography 2018

Journal number: 2018

Journal publisher: SPIE

Published year: 2018

Published pages: 34

DOI identifier: 10.1117/12.2502149

ISBN: 9781-510622142