Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning

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Authors: Aurelie Juncker, William Clark, Benjamin Vincent, Joern-Holger Franke, Sandip Halder, Frederic Lazzarino, Gayle Murdoch

Journal title: Extreme Ultraviolet (EUV) Lithography IX

Journal publisher: SPIE

Published year: 2018

Published pages: 29

DOI identifier: 10.1117/12.2298761

ISBN: 9781-510616592