Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond

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Authors: Sylvain Baudot, Assawer Soussou, Alexey P. Milenin, Toby Hopf, Shouhua Wang, Pieter Wecks, Benjamin Vincent, Joseph Ervin, Steven Demuynck

Journal title: Advances in Patterning Materials and Processes XXXVI

Journal publisher: SPIE

Published year: 2019

Published pages: 22

DOI identifier: 10.1117/12.2514927

ISBN: 9781-510625686