Scatterometry and AFM measurement combination for area selective deposition process characterization

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Authors: Mohamed Saib, Alain Moussa, Anne-Laure Charley, Philippe Leray, Joey Hung, Roy Koret, Igor Turovets, Avron Ger, Shaoren Deng, Andrea Illiberi, Jan Willem Maes, Gabriel Woodworth, Michael Strauss

Journal title: Metrology, Inspection, and Process Control for Microlithography XXXIII

Journal publisher: SPIE

Published year: 2019

Published pages: 57

DOI identifier: 10.1117/12.2515177

ISBN: 9781-510625662