SEM inspection and review method for addressing EUV stochastic defects

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Authors: Tal Itzkovich; Aner Avakrat; Shimon Levi; Omri Baum; Noam Amit; Kevin Houchens

Journal title: SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109591S (7 May 2019)

Journal number: 2019

Journal publisher: SPIE

Published year: 2019