Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction

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Authors: Maximilian Lederer, Thomas Kämpfe, Norman Vogel, Dirk Utess, Beate Volkmann, Tarek Ali, Ricardo Olivo, Johannes Müller, Sven Beyer, Martin Trentzsch, Konrad Seidel, Lukas M. Eng

Journal title: Nanomaterials

Journal number: 10/2

Journal publisher: MDPI

Published year: 2020

Published pages: 384

DOI identifier: 10.3390/nano10020384

ISSN: 2079-4991