Perspectives and tradeoffs of absorber materials for high NA EUV lithography

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Authors: Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer

Journal title: Journal of Micro/Nanolithography, MEMS, and MOEMS

Journal number: 19/04

Journal publisher: S P I E - International Society for Optical Engineering

Published year: 2020

DOI identifier: 10.1117/1.jmm.19.4.041001

ISSN: 1932-5150