Study of EUV reticle storage effects through exposure on EBL2 and NXE

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Authors: Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hoenicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Vijayakrishnan Nair, Eric Hendrickx

Journal title: Extreme Ultraviolet Lithography 2020

Journal publisher: SPIE

Published year: 2020

Published pages: 28

DOI identifier: 10.1117/12.2573125

ISBN: 9781510638433