Better prediction on patterning failure mode with hotspot aware OPC modeling

Summary

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Authors: Chih-I Wei, Stewart Wu, Yunfei Deng, Gurdaman Khaira, Ir Kusnadi, Germain Fenger, Seulki Kang, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns, Gian Lorusso

Journal title: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

Journal publisher: SPIE

Published year: 2021

Published pages: 32

DOI identifier: 10.1117/12.2583837

ISBN: 9781510640566