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Authors: Chang-Nam Ahn, Dong-Seok Nam, Nakgeuon Seong, Anthony Yen
Journal title: SPIE Advanced Lithography
Journal number: Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116090D (2021)
Journal publisher: SPIE
Published year: 2021
DOI identifier: 10.1117/12.2583462
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