Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula

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Authors: Azat Latypov, Gurdaman Khaira, Germain L. Fenger, John L. Sturtevant, Chih-I Wei, Peter De Bisschop

Journal title: Extreme Ultraviolet (EUV) Lithography XI

Journal publisher: SPIE

Published year: 2020

Published pages: 17

DOI identifier: 10.1117/12.2551965

ISBN: 9781510634145