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Authors: Meiyi Wu, Devesh Thakare, Jean-François de Marneffe, Patrick Jaenen, Laurent Souriau, Karl Opsomer, Jean-Philippe Soulié, Andreas Erdmann, Hazem Mesilhy, Philipp Naujok, Markus Foltin, Victor Soltwisch, Qais Saadeh, Vicky Philipsen
Journal title: Extreme Ultraviolet Lithography 2020
Journal publisher: SPIE
Published year: 2020
Published pages: 2
DOI identifier: 10.1117/12.2572114
ISBN: 9781510638433
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