High-NA EUV Lithography Exposure Tool - Advantages and Program Progress

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Authors: Jan van Schoot, Eelco van Setten, Ruben Maas, Kars Troost, Jo Finders, Sjoerd Lok, Rudy Peeters, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser

Journal publisher: EUVL Workshop 2020

Published year: 2020