Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

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Authors: Philipsen, V., Luong, K.V., Souriau, L., Erdmann, A., Evanschitzky, P., van de Kruijs, R.W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S., Reuter, C., Hendrickx, E.

Journal title: Journal of Micro/Nanolithography MEMS and MOEMS 16

Journal publisher: Journal of Micro/Nanolithography MEMS and MOEMS 16

Published year: 2017