First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials

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Authors: Jetske Stortelder, Robert P. Ebeling, Corné Rijnsent, Michel van Putten, Veronique de Rooij-Lohmann, Maximilian Smit, Arnold J. Storm, Norbert Koster, Henk A. Lensen, Vicky Philipsen, Karl Opsomer, Devesh Thakare, Torsten Feigl, Philipp Naujok

Journal title: International Conference on Extreme Ultraviolet Lithography 2021

Journal publisher: SPIE

Published year: 2021

Published pages: 19

DOI identifier: 10.1117/12.2600928

ISBN: 9781510645530