EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update
Project: TAKEMI5
Updated at: 29-04-2024
Resources
5625 items found
EUV lithography industrialization progress
Project: TAKEMI5
Updated at: 29-04-2024
Improved overlay by in slit wafer heating correction from infra red heat flux
Project: TAKEMI5
Updated at: 29-04-2024
VERFAHREN UND VORRICHTUNG ZUR ANORDNUNG VON KLEINDIMENSIONIERTEN BAUTEILEN AN BAUGRUPPEN MIT EXAKTER AUSRICHTUNG DER BAU...
Project: TAKEMI5
Updated at: 29-04-2024
Gas injection systems for particle suppression
Project: TAKEMI5
Updated at: 29-04-2024
Conductive Fluid Based Non-contaminating / No Wear Electrical Transfer Device for Translating Stages
Project: TAKEMI5
Updated at: 29-04-2024
Optische Anordnung, insbesondere für ein EUV-Lithographiesystem
Project: TAKEMI5
Updated at: 29-04-2024
Lastabtragende Haltestruktur
Project: TAKEMI5
Updated at: 29-04-2024
Polarimetrie RCS analysis of traffic objects
Project: RobustSENSE
Updated at: 29-04-2024
Spectral attenuation in low visibility artificial fog: Experimental study and comparison to literature models
Project: RobustSENSE
Updated at: 29-04-2024
Experimental study on spectral absorbance in fog as a function of temperature, liquid water content, and particle size
Project: RobustSENSE
Updated at: 29-04-2024
Automated vehicle system architecture with performance assessment
Project: RobustSENSE
Updated at: 29-04-2024
Functional system architectures towards fully automated driving
Project: RobustSENSE
Updated at: 29-04-2024
Limited Visibility and Uncertainty Aware Motion Planning for Automated Driving
Project: RobustSENSE
Updated at: 29-04-2024
Robust environment perception for the Audi Autonomous Driving Cup
Project: RobustSENSE
Updated at: 29-04-2024
Automotive LIDAR sensor development scenarios for harsh weather conditions
Project: RobustSENSE
Updated at: 29-04-2024
Probabilistic long-term prediction for autonomous vehicles
Project: RobustSENSE
Updated at: 29-04-2024
High-NA EUV lithography exposure tool progress
Project: TAKE5
Updated at: 29-04-2024
High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)
Project: TAKE5
Updated at: 29-04-2024
Scatterometry and AFM measurement combination for area selective deposition process characterization
Project: TAKE5
Updated at: 29-04-2024
Self-aligned fin cut last patterning scheme for fin arrays of 24nm pitch and beyond
Project: TAKE5
Updated at: 29-04-2024
Self-aligned block and fully self-aligned via for iN5 metal 2 self-aligned quadruple patterning
Project: TAKE5
Updated at: 29-04-2024
EUV Lithography, Second Edition
Project: TAKE5
Updated at: 29-04-2024
SEM inspection and review method for addressing EUV stochastic defects
Project: TAKE5
Updated at: 29-04-2024
Modeling of Tone Inversion Process Flow for N5 Interconnect to Characterize Block Tip to Tip
Project: TAKE5
Updated at: 29-04-2024
OPTISCHES SYSTEM UND LITHOGRAPHIEANLAGE
Project: TAKE5
Updated at: 29-04-2024
Radiation analysis system
Project: TAKE5
Updated at: 29-04-2024
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
Project: TAKE5
Updated at: 29-04-2024
State-of-the-art EUV materials and processes for the 7nm node and beyond
Project: TAKE5
Updated at: 29-04-2024
Special Section Guest Editorial: EUV Lithography for the 3-nm Node and Beyond
Project: TAKE5
Updated at: 29-04-2024