Contrast optimization for 0.33NA EUV lithography
Project: SeNaTe
Updated at: 29-04-2024
Resources
5625 items found
The future of EUV lithography: continuing Moore's Law into the next decade
Project: SeNaTe
Updated at: 29-04-2024
NXE pellicle: offering a EUV pellicle solution to the industry
Project: SeNaTe
Updated at: 29-04-2024
Characterization of EBL2 EUV exposure facility
Project: SeNaTe
Updated at: 29-04-2024
EBL2: realization and qualification of an EUV exposure system
Project: SeNaTe
Updated at: 29-04-2024
EUV mask lifetime testing using EBL2
Project: SeNaTe
Updated at: 29-04-2024
Ultra Clean sample transportation in an EUV exposure system
Project: SeNaTe
Updated at: 29-04-2024
First light at EBL2
Project: SeNaTe
Updated at: 29-04-2024
EUV High-NA scanner and mask optimization for sub 8 nm resolution
Project: SeNaTe
Updated at: 29-04-2024
The future of EUV lithography: enabling Moore's Law in the next decade
Project: SeNaTe
Updated at: 29-04-2024
Characterizing electron beam induced damage in metrology and inspection of advance devices
Project: SeNaTe
Updated at: 29-04-2024
Diffuser concepts for in-situ wavefront measurements of EUV projection optics
Project: SeNaTe
Updated at: 29-04-2024
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
Project: SeNaTe
Updated at: 29-04-2024
EUV for HVM: towards and industrialized scanner for HVM NXE3400B performance update
Project: SeNaTe
Updated at: 29-04-2024
EUV lithography industrialization progress
Project: SeNaTe
Updated at: 29-04-2024
EUV lithography performance for manufacturing: status and outlook
Project: SeNaTe
Updated at: 29-04-2024
Process for densifying nitride film
Project: SeNaTe
Updated at: 29-04-2024
Oxygen conducting oxide and oxidation barrier pellicle architecture
Project: SeNaTe
Updated at: 29-04-2024
Alternative membrane manufacturing processes
Project: SeNaTe
Updated at: 29-04-2024
Process for forming silicon-filled openings with a reduced occurrence of voids
Project: SeNaTe
Updated at: 29-04-2024
A method to measure plasma image position in lithography machine
Project: SeNaTe
Updated at: 29-04-2024
Alternative pellicle manufacturing process using waferbonding
Project: SeNaTe
Updated at: 29-04-2024
SiO2 mitigation
Project: SeNaTe
Updated at: 29-04-2024
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Project: SeNaTe
Updated at: 29-04-2024
Removeable pellicle mount with reduced footprint
Project: SeNaTe
Updated at: 29-04-2024
Solutions for direct cooling of mirror in projection optics box to reduce optical surface deformations
Project: SeNaTe
Updated at: 29-04-2024
Engineering strategies for early pellicle failure warning and detection before failure occurs
Project: SeNaTe
Updated at: 29-04-2024
Process for forming silicon-filled openings with a reduced occurrence of voids
Project: SeNaTe
Updated at: 29-04-2024
Semiconductor device fabrication using etch stop layer
Project: SeNaTe
Updated at: 29-04-2024
Method and apparatus for filling a gap
Project: SeNaTe
Updated at: 29-04-2024