EUV High-NA scanner and mask optimization for sub 8 nm resolution
Project: SeNaTe
Updated at: 29-04-2024
Resources
5625 items found
The future of EUV lithography: enabling Moore's Law in the next decade
Project: SeNaTe
Updated at: 29-04-2024
EBL2: realization and qualification of an EUV exposure system
Project: SeNaTe
Updated at: 29-04-2024
Characterization of EBL2 EUV exposure facility
Project: SeNaTe
Updated at: 29-04-2024
Latest developments on EUV reticle and pellicle research and technology at TNO
Project: SeNaTe
Updated at: 29-04-2024
Realisation of a vacuum system for EUV beam line EBL2
Project: SeNaTe
Updated at: 29-04-2024
Optimized phase-shifting masks for high-resolution resist patterning by interference lithography
Project: SeNaTe
Updated at: 29-04-2024
Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field...
Project: SeNaTe
Updated at: 29-04-2024
Ultra Clean sample transportation in an EUV exposure system
Project: SeNaTe
Updated at: 29-04-2024
First light and results on EBL2
Project: SeNaTe
Updated at: 29-04-2024
Characterizing electron beam induced damage in metrology and inspection of advance devices
Project: SeNaTe
Updated at: 29-04-2024
Diffuser concepts for in-situ wavefront measurements of EUV projection optics
Project: SeNaTe
Updated at: 29-04-2024
EUV lithography industrialization progress
Project: SeNaTe
Updated at: 29-04-2024
EUV lithography performance for manufacturing: status and outlook
Project: SeNaTe
Updated at: 29-04-2024
EUV for HVM: towards and industrialized scanner for HVM NXE3400B performance update
Project: SeNaTe
Updated at: 29-04-2024
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
Project: SeNaTe
Updated at: 29-04-2024
Process for densifying nitride film
Project: SeNaTe
Updated at: 29-04-2024
Alternative pellicle manufacturing process using waferbonding
Project: SeNaTe
Updated at: 29-04-2024
Alternative membrane manufacturing processes
Project: SeNaTe
Updated at: 29-04-2024
Process for forming silicon-filled openings with a reduced occurrence of voids
Project: SeNaTe
Updated at: 29-04-2024
Oxygen conducting oxide and oxidation barrier pellicle architecture
Project: SeNaTe
Updated at: 29-04-2024
A method to measure plasma image position in lithography machine
Project: SeNaTe
Updated at: 29-04-2024
SiO2 mitigation
Project: SeNaTe
Updated at: 29-04-2024
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Project: SeNaTe
Updated at: 29-04-2024
Engineering strategies for early pellicle failure warning and detection before failure occurs
Project: SeNaTe
Updated at: 29-04-2024
Solutions for direct cooling of mirror in projection optics box to reduce optical surface deformations
Project: SeNaTe
Updated at: 29-04-2024
Si/B membranes for emissive pellicles
Project: SeNaTe
Updated at: 29-04-2024
Semiconductor device fabrication using etch stop layer
Project: SeNaTe
Updated at: 29-04-2024
Process for forming silicon-filled openings with a reduced occurrence of voids
Project: SeNaTe
Updated at: 29-04-2024
Removeable pellicle mount with reduced footprint
Project: SeNaTe
Updated at: 29-04-2024