RMG nMOS 1<sup>st</sup> process enabling 10x lower gate resistivity in N7 bulk FinFETs
Project: SeNaTe
Updated at: 29-04-2024
Resources
5625 items found
Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and proces...
Project: SeNaTe
Updated at: 29-04-2024
Introducing the EUV CNT pellicle
Project: SeNaTe
Updated at: 29-04-2024
Modeling of Tone Inversion Process Flow for N5 Interconnect to Characterize Block Tip to Tip
Project: SeNaTe
Updated at: 29-04-2024
Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber m...
Project: SeNaTe
Updated at: 29-04-2024
Mitigating EUV mask 3D effects by alternative metal absorbers
Project: SeNaTe
Updated at: 29-04-2024
Self-aligned-quadruple-patterning for N7/N5 silicon fins
Project: SeNaTe
Updated at: 29-04-2024
Predicting LER and LWR in SAQP with 3D virtual fabrication
Project: SeNaTe
Updated at: 29-04-2024
High Mobility Materials on Insulator for Advanced Technology Nodes
Project: SeNaTe
Updated at: 29-04-2024
Sub 20nm particle inspection on EUV mask blanks
Project: SeNaTe
Updated at: 29-04-2024
Parallel, high throughput atomic force metrology for EUV masks and wafers
Project: SeNaTe
Updated at: 29-04-2024
EBL2: EUV exposure and surface analysis system
Project: SeNaTe
Updated at: 29-04-2024
Correlated diffuse x-ray scattering from periodically nanostructured surfaces
Project: SeNaTe
Updated at: 29-04-2024
Polarization resolved measurements with the new EUV ellipsometer of PTB
Project: SeNaTe
Updated at: 29-04-2024
Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Project: SeNaTe
Updated at: 29-04-2024
Realization of an in-situ Mueller-matrix imaging ellipsometer for the real time observation of surface properties in an ...
Project: SeNaTe
Updated at: 29-04-2024
Efficient simulation of EUV pellicles
Project: SeNaTe
Updated at: 29-04-2024
Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Project: SeNaTe
Updated at: 29-04-2024
Advanced EUV mask and imaging modeling
Project: SeNaTe
Updated at: 29-04-2024
Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
Project: SeNaTe
Updated at: 29-04-2024
EBL2: high power EUV exposure facility
Project: SeNaTe
Updated at: 29-04-2024
EBL2, a flexible, controlled EUV exposure and surface analysis facility
Project: SeNaTe
Updated at: 29-04-2024
Characterization of optical material parameters for EUV Lithography applications at PTB
Project: SeNaTe
Updated at: 29-04-2024
Vertically stacked gate-all-around Si nanowire transistors: key process optimizations and ring oscillator demonstration
Project: SeNaTe
Updated at: 29-04-2024
Realisation of a vacuum system of an EUV exposure system Presentation
Project: SeNaTe
Updated at: 29-04-2024
The future of EUV lithography: continuing Moore's Law into the next decade
Project: SeNaTe
Updated at: 29-04-2024
EUV High-NA scanner and mask optimization for sub 8 nm resolution
Project: SeNaTe
Updated at: 29-04-2024
Contrast optimization for 0.33NA EUV lithography
Project: SeNaTe
Updated at: 29-04-2024
NXE pellicle: offering a EUV pellicle solution to the industry
Project: SeNaTe
Updated at: 29-04-2024
The future of EUV lithography: enabling Moore's Law in the next decade
Project: SeNaTe
Updated at: 29-04-2024